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SPIN 150i :ÃÖ¼Ò¼³Ä¡¸éÀûÀÇ ½ºÇÉÄÚÅÍ (N2ÆÛÁö¿ë ½ºÇÉÄÚÅÍ)

 

Å©±â: 274mm(w) x 451mm(d) x 254mm(h)

Űº¸µå ºÐ¸®½Ã :251mm(w) x 251mm(d) x 254mm(h)

 

Specifications

½Ì±ÛÇÁ·Î¼¼½º¿ë ½ºÇÉÄÚÅÍ.
¿ëµµ :cleaning, drying, coating, developing
etching up to ¨ª160mmsubstrates:

* °¡´É»çÀÌÁî: up to ¨ª160mm wafer,100mm x 100mm
- ÀçÁú : Full Ç÷¡½ºÆ½ ÇÏ¿ì¡(NPP) -¿É¼Ç:Å×Ç÷Р°¡´É
- TÅõ¸íÇÑ ¶Ñ²±¹× Áß¾Ó¿¡ µð½ºÆæ½Ì¿ë ½Ã¸°ÁöȦ´õHall
- ¼öµ¿ µð½ºÆæ½Ì¹× ¿ÀÅäµð½ºÆæ½Ì °¡´É(¿É¼ÇŰƮ ÇÊ¿ä)
- Automatic safety lid lock with sensor interlock
- Detachable controller interface for easy

integration :spin150I-Ind Çü(±Û·Îºê¹Ú½º ¼³Ä¡½Ã À¯¸®) .
- N2 diffuser for N2 purge during process-N2 ÆÛÁö ±â´É ÀåÂø
- Easy, step-by-step recipe programming via large

- colour touchscreen
- Unlimited Program Storage for recipes with

- multiple steps / each for:
- Time 0.1-99999 sec/step
- Speed 0-12,000 rpm
- ȸÀü¹æÇâ º¯°æ °¡´É (CW, CCW, puddling)
- Acceleration / Deceleration 1-30,000rpm/sec,

-selectable per step
- Vacuum On/Off
- 3 Programmable Dry Contacts:
e.g. for automated control of Dispense unit,

- Nitrogen diffuser, etc.
- Structured and password protected recipe

- storage for easy and safe management
- °íÁ¤¹Ð µ¶ÀÏÁ¦ DC¼­º¸ ¸ðÅÍ ÀåÂø ÃÖ°íÀÇ Coating Thickness Uniformaty ½ÇÇö °¡´É Standard included: ? (1) standard - Vacuum Chuck A-V36-S45-PP-HD, ¨ª45mm for up to ¨ª6¡° wafers.

- (1) D-V10-S50-PP, Small Fragment Adapter
(for ¨ª ¨ö¡°- ¨ª 2¡¯¡¯ Pieces and Fragments optional) (Alternative chucks optionally available)
- Drain connection 1¡± male NPT (Exhaust Hose optionally available

 

 

 

 

Mask Cleaner

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ALD System(Atomic Layer Deposition)

espro Flowmeter

À缺ITS co,
Tel:031-479-4211/2
Mail: contrabase26@gmail.com     jsi@jsits.com
 °æ±âµµ ¾È¾ç½Ã µ¿¾È±¸ ¿¤¿¡½º·Î 92 ±¹Á¦À¯Åë¼¾ÅÍ 17µ¿ 127È£
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